§MLFMA
has been applied for calculating currents on photomasks and aerial images on
object planes
§The
computational complexities for memory requirement and CPU time are O(N) and O(N log N),
respectively, where N is the number of unknowns
§Fields
in dielectric materials are modeled by a volume integral equation
§Number
of unknowns and simulation time can be significantly reduced if SIE (PMCHW formulation) is
used instead of VSIE
§VSIE
is more efficient for simulating structures with thin dielectric layers
§Fast
field calculation by MLFMA applies to both VSIE and SIE formulations
§Promising
technologies for fast aerial image calculation for the next generation photolithography
simulation