•Motivation
•Apply MLFMA for photolithography simulation
•Fast calculation of aerial images for critical features
(gates, contacts, vias, etc.)
•Avoid grid dispersion errors in FEM and FDTD. No ABC.
•Expedite the traditional method of moments (MOM)
•CG-FFT needs special modification for X Architecture
lithography
•Capabilities
•Volume-surface integral equation (VSIE) for modeling
inhomogeneous dielectric and PEC scatterers (photomasks, multilayered reflective
coating)
•Impedance boundary condition (IBC) for modeling thin
dielectric coating and lossy metal surfaces (material surfaces beneath PR)
•Resistive surface formulation for modeling thin dielectric
sheets (TDS) (add phase shifts to incident field)
•The code is originally designed for wire antenna
simulations and contains multiple types of basis functions: surface, wire,
junction, and volume.
•Examples
•Formulation